Semiconductor
High-precision gas flow measurement and control in wafer manufacturing
Overview
Semiconductor device manufacturing covers core processes including lithography, chemical vapor deposition, etching, implantation, and diffusion. GASKITO provides high-precision mass flow meters and controllers for the semiconductor industry, helping optimize every critical process step. As chips move toward smaller sizes and higher performance, precision and stability requirements for process gas flow control have increased. GASKITO MEMS flow chip technology enables nanometer-level precision gas flow control.
Consult NowApplication Examples
Atomic Layer Deposition (ALD)
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)
Etching Process
Ion Implantation
MOCVD Epitaxy
Wafer Cleaning
Annealing Process
Atomic Layer Deposition (ALD)
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)
Etching Process
Ion Implantation
MOCVD Epitaxy
Wafer Cleaning
Annealing Process
Challenges
Precise gas control for ultra-thin layer deposition
Process requirements for smaller critical dimensions
Flow stability for 3D structure manufacturing
Sustained stable operation for high yield
Our Solutions
MEMS chip technology for high-precision measurement
Metal seal design for ultra-clean processes
Millisecond response for real-time precise control
Full-process technical support and consulting services
Application Cases
Learn about our real-world applications
MOCVD Process Flow Control
Metal-organic chemical vapor deposition (MOCVD) is a key process in LED manufacturing, depositing ultra-thin crystal layers on wafers to produce high-performance LEDs. Precise control of hydrogen and other carrier gases is required to achieve optimized uniformity and consistency.
Customer Requirements
- Precision and stability of hydrogen flow regulation
- Metal-sealed flow and pressure controllers with fast response
- Comprehensive service and customer support
Solution
GASKITO provides high-quality metal-sealed mass flow controllers to ensure stable and precise gas flow. The controllers regulate hydrogen carrier gas flow, which is critical for process stability. Flow directly affects the deposition rate of LED elements, so precise control is essential.
Customer Benefits
- Improved film uniformity
- Stable and repeatable process
- Reduced gas waste
- Excellent customer support
Application Scenarios
MOCVD Process
Precise control and proportioning of carrier gas in LED manufacturing
Wafer Transfer
Clean gas control in FOUP purge process
Atomic Layer Deposition
Precise metering of precursor gases in ALD process
Supercritical Fluid Process
Stable measurement and control of fluids in supercritical state
Need a Custom Solution?
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