High PrecisionFast ResponseSmart Control
Pressure Measurement & Control
KP200 Series
KP200 Series all-metal sealed gas pressure controller features long-term stable and reliable operation, high control precision, and good environmental adaptability. Supports upstream control mode, full-scale control pressure 1200mBar, supports RS485, EtherCAT and 0~5V communication. Suitable for semiconductor, photovoltaic, vacuum coating and other industries.
Key Specifications
Pressure TypeAbsolute pressure
Full-scale Control Pressure1200mBar
Pressure Control Accuracy±1%SP(≥10%FS) / 0.2%FS(<10%FS)
Response Time<1s
Pressure Resolution0.1mBar
Max Pressure Rating3MPa
Applications
Analytics
Other Industries
Semiconductor
Hydrogen Energy
Surface Treatment
Laboratory
Model Specifications
| 基本参数 | |
| 压力类型 | 绝压 |
| 全量程控制压力 | 1200 mBar |
| 耐压 | 3 MPa |
| 控制方式 | 上游 |
| 阀口全量程流量 | 2、3、5 SLM |
| 响应时间 | <1 s |
| 温度系数 | <0.02%FS/℃ |
| 压力分辨率 | 0.1 mBar |
| 压力控制精度 | ±1%SP(≥10%FS) / 0.2%FS(<10%FS) |
| 机械接口 | |
| 机械接口 | 1/4 inch卡套、1/4 inch VCR |
| 电气接口 | M8、RJ45双网口、DB9M |
| 通讯方式 | RS485、EtherCAT、0~5V |
| 阀门特性 | |
| 阀门类型 | 常闭 |
| 外漏率 | <1×10⁻¹² Pa·m³/s (He) |
| 内漏率 | <0.1%FS |
| 电气参数 | |
| 供电电压 | 15~24VDC |
| 环境条件 | |
| 工作温度范围 | 10~50 ℃ |
•KP200系列全金属密封气体压力控制器长期工作稳定可靠，高控制精度。
•适用于半导体、光伏、真空镀膜等行业。
Key Features
High Precision
±0.25%F.S. accuracy
Fast Response
Real-time pressure monitoring
High Pressure
High pressure environments
Corrosion Resistant
316L stainless steel
Multiple Outputs
Analog/Digital signals
Easy Installation
Multiple mounting options
Applications
Analytics
Other Industries
Semiconductor
Hydrogen Energy
Surface Treatment
Laboratory
Downloads
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